NIST CSF 2.0 Profile for Semiconductor Manufacturing – Comment Period Extended & Workshop Recording Available

The NCCoE, in partnership with the SEMI Consortium for Semiconductor Cybersecurity, has published a public review version of NIST IR 8546, CSF 2.0 Semiconductor Manufacturing Community Profile.

NIST CSF 2.0 Profile for Semiconductor Manufacturing – Comment Period Extended & Workshop Recording Available



The NCCoE, in partnership with the SEMI Consortium for Semiconductor Cybersecurity, has published a public review version of NIST IR 8546, CSF 2.0 Semiconductor Manufacturing Community Profile.

The duration for public feedback on this version has been prolonged until May 30, 2025, 11:59 p.m. EDT. All received feedback will be assessed and resolved to shape the final release.

The Preliminary NIST Internal Report (IR) 8546, Cybersecurity Framework 2.0 Semiconductor Manufacturing Community Profile, outlines an optional, risk-centric methodology to oversee cybersecurity efforts and mitigate cybersecurity threats within semiconductor manufacturing. This Profile targets anticipated cybersecurity results and can be leveraged as a manual to uplift the existing cybersecurity stance of the semiconductor manufacturing ecosystem.

The Public Workshop on Cybersecurity Framework Profile for Semiconductor Manufacturing that transpired on March 13, 2025, can now be accessed via the NCCoE event page.

About Author

Subscribe To InfoSec Today News

You have successfully subscribed to the newsletter

There was an error while trying to send your request. Please try again.

World Wide Crypto will use the information you provide on this form to be in touch with you and to provide updates and marketing.